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aims193  (Carl Zeiss)


Bioz Verified Symbol Carl Zeiss is a verified supplier
Bioz Manufacturer Symbol Carl Zeiss manufactures this product  
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    Structured Review

    Carl Zeiss aims193
    Aims193, supplied by Carl Zeiss, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/aims193/aims193/us12326656-241-41-44
    Average 90 stars, based on 1 article reviews
    aims193 - by Bioz Stars, 2026-09
    90/100 stars

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    Article Title: Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
    Article Snippet: Furthermore, by using AIMS193 (manufactured by Carl Zeiss), the transfer mask 20 of Example 2 was subjected to simulation of an exposure transfer image when exposure transfer was carried out onto a resist film on a semiconductor device using exposure light having a wavelength of 193 nm, in the manner similar to Example 1.

    Article Title: Mask blank and method of manufacturing photomask
    Article Snippet: Moreover, regarding the phase shift mask 200 of Example 1, a simulation of a transfer image was made when an exposure transfer was made on a resist film on a semiconductor device at an exposure light of 193 nm wavelength, using AIMS193 (manufactured by Carl Zeiss).

    Article Title: Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
    Article Snippet: Furthermore, by using AIMS193 (manufactured by Carl Zeiss), the transfer mask 20 of Comparative Example 1 was subjected to simulation of an exposure transfer image when exposure transfer was carried out onto a resist film on a semiconductor device using exposure light having a wavelength of 193 nm, in the manner similar to Example 1.

    Article Title: Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device
    Article Snippet: Furthermore, by using AIMS193 (manufactured by Carl Zeiss), the transfer mask 20 was subjected to simulation of an exposure transfer image when exposure transfer was carried out onto a resist film on a semiconductor device using exposure light having a wavelength of 193 nm.

    Article Title: Mask blank and method of manufacturing photomask
    Article Snippet: Further, on the phase shift mask of Comparative Example 1, a simulation of a transfer image was made when an exposure transfer was made on a resist film on a semiconductor device at an exposure light of wavelength 193 nm using AIMS193 (manufactured by Carl Zeiss), similar to Example 1.

    Article Title: Mask blank and method of manufacturing photomask
    Article Snippet: Further, on the phase shift mask of Comparative Example 2, a simulation of a transfer image was made when an exposure transfer was made on a resist film on a semiconductor device at an exposure light of wavelength 193 nm using AIMS193 (manufactured by Carl Zeiss), similar to Example 1.

    Article Title: Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
    Article Snippet: Furthermore, by using AIMS193 (manufactured by Carl Zeiss), the transfer mask 20 was subjected to simulation of an exposure transfer image when exposure transfer was carried out onto a resist film on a semiconductor device using exposure light having a wavelength of 193 nm.

    Article Title: Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
    Article Snippet: Furthermore, by using AIMS193 (manufactured by Carl Zeiss), the transfer mask of Comparative Example 2 was subjected to simulation of an exposure transfer image when exposure transfer was carried out onto a resist film on a semiconductor device using exposure light having a wavelength of 193 nm, in the manner similar to Example 1.



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    aims193  (Carl Zeiss)
    90
    Carl Zeiss aims193
    Aims193, supplied by Carl Zeiss, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/aims193/aims193/us12326656-241-41-44
    Average 90 stars, based on 1 article reviews
    aims193 - by Bioz Stars, 2026-09
    90/100 stars
    		  Buy from Supplier

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